Erwin Olaf

16 February–12 May 2019

Exhibition Overview

Shanghai Huai.jpg

Erwin Olaf, Shanghai, Huai Hai 116, Portrait #2, 2017 © Erwin Olaf. Courtesy Hamiltons Gallery, London / Edwynn Houk Gallery, New York.

Gemeentemuseum Den Haag and The Hague Museum of Photography are to honour one of the Netherlands’ most famous photographers, Erwin Olaf (b. 1959), with a double exhibition. Olaf, whose recent portraits of the royal family drew widespread admiration, will turn sixty this year – a good moment to stage a major retrospective. The Hague Museum of Photography will focus on Olaf’s love of his craft and his transition from analogue photojournalist to digital image-maker and storyteller. Olaf will himself bring together some twenty photographs by famous photographers of the past who have been a vital source of inspiration to him. Gemeentemuseum Den Haag will show non-commissioned work by Olaf from 2000 to his most recent series, including the work he produced in Shanghai and his most recent series Palm Springs, on display for the first time. Olaf will be showing his photography in the form of installations, in combination with film, sound and sculpture.

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